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德國(guó)AIXUV GmbH
AIXUV 有限公司是一家Extreme Ultraviolet radiation-XUV（極紫外線輻射）系統(tǒng)光源和部件的供應(yīng)商。該公司的核心產(chǎn)品是基于壓縮氣體發(fā)光的EUV（極紫外線）燈，這種燈主要用于EUV 平板印刷元件的開發(fā)，或作為一種新的分析手段。
XUV（極紫外線輻射）的光譜范圍介于X- 光和真空紫外線之間。在此范圍內(nèi)，內(nèi)核電子的光電效應(yīng)占主導(dǎo)地位。XUV 光譜范圍包括X 軟光（用來(lái)檢測(cè)活細(xì)胞）和EUV（可能應(yīng)用于將來(lái)的芯片平版印刷）。EUV 同時(shí)支持10 納米級(jí)的橫向解析度和最高的交叉截面，這使得XUV 特
別適合應(yīng)用于未來(lái)的芯片生產(chǎn)和納米技術(shù)。
我們的EUV 燈附加了環(huán)形光束，可用于單獨(dú)的實(shí)驗(yàn)室。我們?yōu)榭蛻糸_發(fā)部件，甚至整個(gè)全自動(dòng)系統(tǒng)解決方案。與客戶一邊溝通一邊進(jìn)行開發(fā)是最有效最成功的方法。AIXUV 有限公司的EUV 燈電極壽命超過(guò)1000 小時(shí)并且適用于多種用途。我們的客戶用EUV 燈開發(fā)出了用來(lái)檢測(cè)EUV 光源特性的量具，并將EUV 燈應(yīng)用于EUV 顯微鏡。此外，我們根據(jù)客戶的需要開發(fā)了以EUV 燈為基礎(chǔ)的工具，用于檢測(cè)EUV 的曝光性和EUV 反射計(jì)的特性。
AIXUV GmbH (pronounced: aex-u-v) is a supplier of sources, components and systems using
Extreme Ultraviolet radiation. AIXUV?s core product is the compact gas discharge based
EUV-lamp which is used for the development of components for EUV lithography and for
new analytical approaches.
Extreme Ultraviolet radiation (XUV) is the spectral range between X-rays and vacuum
ultraviolet. The spectral range is defined by the fact that the photoeffect of inner-shell
electrons is the dominating interaction process with matter. XUV includes spectral ranges
known as soft X-rays (used for investigations of living cells) and EUV (of interest for future
chip lithography). Extreme Ultraviolet radiation offers simultaneously the potential of
lateral resolution down to 10 nanometers and the highest cross sections for the interaction of
radiation with matter. This makes XUV of special interest for future chip production and for
nanotechnology.
Our EUV-lamps are designed to supplement storage ring beamlines for enabling applications
in the individual R&D lab. Our team is developing customer specific solutions for components
up to fully automatic complex system solutions. Step-by-step communicated development with
our customers has proofed to be the most efficient and sucessful approach. AIXUV?s EUVlamps
reach electrode lifetimes beyond 1000 hours and are routinely tailored for a variety of
applications. EUV-lamps are used by our customers for the development of metrological tools
for characterizing EUV-sources and in EUV-microscopes. Tools based on our EUV-lamps
have been developed customer specific and are used for investigations of EUV-resist and
characterizing EUV-maskblanks.